Graphene supercapacitor pilot production facility

Swinburne's Graphene Supercapacitor Pilot Production Facility allows researchers and industrial collaborators to manufacture industrial standard graphene supercapacitor prototype and measure the performance with electrochemical characterizations.

This world-class facility is the first of its kind for manufacturing supercapacitors with laser produced porous graphene as the electrode materials.  The pilot production line is designed and built for a $2 million 2-year industrial project to manufacture commercially viable prototype of graphene supercapacitors, that employs state-of-the-arts graphene manufacturing technology. The purpose of the pilot production line is to learn about the new technology, understand the potential and design the strategy for large-scale production. The knowledge obtained is then used for design of full-scale production systems and commercial products, as well as for identification of further research objectives and support of investment decisions.

The pilot production line integrates all the manufacturing process of the graphene supercapacitor in the form of pouch, from the raw material preparation to the sealing and testing process.  Each machine in the pilot production line is customized according to the unique properties of porous graphene electrode materials, and the prototype products from the pilot production line can meet industrial standard and find direct applications. Tens of pouch cell products can be produced daily.

The advance electrochemical measurement system is able to perform different characterization methods, such as cyclic voltammetry (CV), cyclic charge and discharge (CC), electrochemical impedance spectroscopy (EIS), and can do parallel measurement with multichannel. All the characteristics of a supercapacitor, including specific capacitance, energy density, power density and internal resistance, can be measured.

The cutting-edge capability available within the facility include:

  • Roll to roll coating of the graphene film
  • Automatic cutting and slitting
  • Automatic stacking of the graphene electrodes
  • Nitrogen glovebox
  • Pouch forming and sealing
  • Automatic electrolyte injection
  • Electrochemical characterization of supercapacitors

The Graphene Supercapacitor Pilot Production facility is part of Swinburne’s Centre for Translation Atomaterials

Contact

The facility welcomes enquiries from other universities, industry and postgraduate students.

Professor Baohua Jia

Email: bjia@swin.edu.au

Ultracompact laser 3D nanoprinting setup

The ultracompact 3D laser nanoprinting set up is a fully automated nanofabrication system that has the following capabilities:

  1. Fabrication of any 2D and 3D structures
  2. Printing on arbitrary materials, including polymer, glass, crystals, metals, and 2D materials.
  3. High resolution which is down to 200 nm
  4. Correction for aberrations and improve the profile of the fabrication
  5. Ultracompact all-in-one turn key system
  6. Broad applications: 3D photonic devices fabrication, fibre gratings, waveguide and 2D material devices.

Advanced solar panel pilot production

The solar panel pilot production facility is the only one fully automated multichamber physical vapor deposition (PVD) facility in Australia, which is developed by Swinburne researchers collaborated with Suntech engineers. The capabilities of the solar panel pilot production line are:

  1. Integrate all the process, which is able to manufacture entire solar panel from glass substrate
  2. Full robotic arm operation meeting the industrial standard. The panels stay in the protected environment without exposure to air or humidity, improving the quality.

Solar Simulator

  • Applying daylight simulation to the field of photobiology
  • Provides standard-compliant UV light with non-uniformity of spectral illumination over the entire sampling area <5%
  • Using a unique integrated attenuation device, the maximum available daylight output varies between 10 and 100%
  • Linear adjustment rate equals to 0.01%

Spectrometer (3D WB Det. Module)

  • A dual monochromator and dual beam scanning spectrophotometer
  • Make accurate measurements in the 175 – 3300 nm wavelength range for spectrum
  • Test the optical density, reflection and transmission coefficients of liquids and solid materials and materials, including light scattering inorganic, organic and biological objects
  • Using interchangeable analysis modules to solve various problems in spectral analysis

Electron Beam Lithography

  • 150x150mm stage for direct writing over 6” wafers
  • Automatic airlock for sample loading
  • Schottky thermal field-emission filament
  • 200V-30kV beam acceleration
  • 2pA-10nA beam current
  • 2nm beam resolution at 20kV
  • Laser interferometer for stage positioning
  • with ~30nm precision 

Reactive Ion Etcher

  • Process up to 4″ wafers
  • Proprietary Tornado ICP high density plasma source
  • Fluorine and chlorine chemistry capable
  • Unique chamber design allows etching of a large range of materials
  • Optional Electrostatic chuck and Helium backside cooling
  • Metal etching process kit for repeatable metal etching
  • Small footprint and “all-in-one” design 

Ion Beam Lithography

  • High accuracy, low distortion deflection and blanking, for optimised write field calibration
  • Ultra precise laser interferometer stage – large area pattern stitching and overlay with less than 10nm mean accuracy
  • Full 5 axis capability for 3D patterning and quality control
  • 5 line gas injection system – and range of pre-cursor materials. 

Nano-Imprint Lithography Tool

  • Process up to 4″ wafers
  • Proprietary Tornado ICP high density plasma source
  • Fluorine and chlorine chemistry capable
  • Unique chamber design allows etching of a large range of materials
  • Optional Electrostatic chuck and Helium backside cooling
  • Metal etching process kit for repeatable metal etching
  • Small footprint and “all-in-one” design 

Thin Film Deposition System (PVD)

  • 18″ diameter x 15″ deep cylindrical 304 stainless steel chamber
  • Six radial process ports
  • Hinged front-loading door
  • Door- or port-mounted substrate fixtures
  • Turbomolecular or cryogenic pumping
  • Available with up to six TORUS® circular magnetron sputtering sources
  • Available with up to three thermal evaporation sources

3D Optical Profiler

  • 6 inch motorised XY stage
  • Tip-tilt in the system stage
  • Motorised Objective Lens Turret, 4 position (5x, 20x, 50x, 115x Interferometric Objectives)
  • XY Stitching software package
  • Field of view lenses: 0.55x, 1.0x, 2.0x
  • Step Height Standard, 8μm